Semiconductor device with high-K gate dielectric layer and fabrication method thereof

ABSTRACT

Semiconductor devices and fabrication methods thereof are provided. An exemplary fabrication method includes forming an interlayer dielectric layer on a base substrate; forming a plurality of first openings and second openings in the interlayer dielectric layer, one first opening connecting to a second opening, the one first opening being between the second opening and the base substrate; forming a high-K gate dielectric layer on side and bottom surfaces of the first openings and on side surfaces of the second openings; forming a cap layer, containing oxygen ions, on the high-K gate dielectric layer; forming an amorphous silicon layer on the cap layer at least on the bottoms of the first openings; performing a thermal annealing process on the amorphous silicon layer, the cap layer and the high-K dielectric; removing the amorphous silicon layer; and forming a metal layer, in the first openings and the second openings.

CROSS-REFERENCES TO RELATED APPLICATIONS

This application claims the priority of Chinese patent application No.201610531682.8, filed on Jul. 7, 2016, the entirety of which isincorporated herein by reference.

FIELD OF THE DISCLOSURE

The present disclosure generally relates to the field of semiconductortechnologies and, more particularly, relates to semiconductor devicesand fabrication methods thereof.

BACKGROUND

The major devices in integrated circuits (ICs), especiallyvery-large-scale-integration (VLSI), include metal-oxide-semiconductorfield-effect transistors (MOS transistors). With the continuousdevelopments of the IC manufacturing, technology, the technical node ofthe semiconductor device technology has become smaller and the smaller;and the geometric dimension of the semiconductor structures has becomesmaller and smaller by following the Moore's law. When the size of thesemiconductor devices is reduced to a certain extent, secondary effectscaused by the physical limitations of the semiconductor structuressuccessively emerge. Accordingly, the critical dimension reduction inproportion of the semiconductor structures has become more and moredifficult. One of the most challenging issues in the field ofsemiconductor manufacturing is about the large leakage current problemin the semiconductor structures, which is mainly caused by thecontinuous reduction of the thickness of the conventional gatedielectric layer.

The current approach to solve such issues is to replace the conventionalsilicon dioxide gate dielectric material with a high-K dielectricmaterial; and use a metal material as the gate electrode. Such aconventional method may avoid the Femi level pin effect and the borondiffusion effect of the high-K material and the conventional gatematerial. The inclusion of the high-K metal gate (HKMG) reduces theleakage current of the semiconductor structures.

Although the introduction of the HKMG structures is able to improve theelectrical properties of the semiconductor structures to a certainextent, the semiconductor devices formed by the existing methods mayneed further improvements. The disclosed semiconductor structures andmethods are directed to solve one or more problems set forth above andother problems in the art.

BRIEF SUMMARY OF THE DISCLOSURE

One aspect of the present disclosure includes a method for fabricating asemiconductor device. The method includes providing forming aninterlayer dielectric layer on a base substrate; forming a plurality offirst openings and second openings in the interlayer dielectric layer,one first opening connecting to a second opening, the one first openingbeing between the second opening and the base substrate to expose thebase substrate; forming a high-K gate dielectric layer on side andbottom surfaces of the first openings and on side surfaces of the secondopenings; forming a cap layer, containing oxygen ions, on the high-Kgate dielectric layer; forming an amorphous silicon layer on the caplayer at least on the bottoms of the first openings; performing athermal annealing process on the amorphous silicon layer, the cap layerand the high-K dielectric layer to cause the oxygen ions to diffuse intothe high-K dielectric layer; removing the amorphous silicon layer; andforming a metal layer to fill the first openings and the secondopenings.

Another aspect of the present disclosure includes a semiconductordevice. The semiconductor device includes a base substrate having a PMOSregion and an NMOS region; a plurality gate structures formed on thebase substrate, the gate structures including an interface layer formedon the base substrate, a high-K gate dielectric layer formed on theinterface layer, a cap layer formed on the high-K gate dielectric layerand a metal layer formed over the high-K gate dielectric layer; aninterlayer dielectric layer covering side surfaces of the gatestructures formed over the base substrate; and source/drain dopingregions formed in the base substrate at two sides of the gatestructures. The gate structures is formed by forming a plurality offirst openings and second openings in the interlayer dielectric layer,one first opening connecting to a second opening, the first openingbeing between the second opening and the base substrate to expose thebase substrate; forming the high-K gate dielectric layer on side andbottom surfaces of the first openings and side surfaces of the secondopenings; forming an cap layer, containing oxygen ions, on the high-Kgate dielectric layer; forming an amorphous silicon layer at least onthe bottoms of the first openings; performing a thermal annealingprocess on the amorphous silicon layer, the cap layer and the high-Kdielectric layer to cause the oxygen ions to diffuse into the high-Kdielectric layer; removing the amorphous silicon layer; and forming themetal layer over the cap layer to fill up the first openings and thesecond openings.

Other aspects of the present disclosure can be understood by thoseskilled in the art in light of the description, the claims, and thedrawings of the present disclosure.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1-11 illustrate semiconductor structures corresponding to certainstages of an exemplary fabrication process of a semiconductor deviceconsistent with the disclosed embodiments; and

FIG. 12 illustrates an exemplary fabrication process of a semiconductordevice consistent with the disclosed embodiments.

DETAILED DESCRIPTION

Reference will now be made in detail to exemplary embodiments of theinvention, which are illustrated in the accompanying drawings. Whereverpossible, the same reference numbers will be used throughout thedrawings to refer to the same or like parts.

When using the high-K dielectric material as the gate dielectricmaterial, the leakage current of semiconductor structures can bereduced. However, the dielectric relaxation current (DR current) of thesemiconductor devices is still large. The large DR current maydeteriorate the electrical properties of the semiconductor devices. Forexample, the positive bias temperature instability (PBTI) and thenegative bias temperature instability (NBTI) of the semiconductordevices may be noticeable. The large DR current in the semiconductordevices is often caused by the deflects in the high-K dielectricmaterial. The defects generate electron traps in the high-K dielectricmaterial; and cause the DR phenomenon to be noticeable; and cause thehigh-K dielectric material to have a large loss angle.

The defects in the high-K dielectric material include one or more ofoxygen vacancies, dangling bonds, nonbonding ions, etc. If the defectsin the high-K dielectric material are reduced, the electrical propertiesof the semiconductor devices can be significantly improved. Thus, afterforming the high-K gate dielectric layer, a cap layer is formed on thehigh-K gate dielectric layer. Then, a thermal annealing process isperformed on the cap layer and the high-K gate dielectric layer. Thethermal annealing process is able to cause oxygen ions in the cap layerto diffuse into the high-K gate dielectric layer. The oxygen ions occupythe oxygen vacancies; and the number of the oxygen vacancies in thehigh-K gate dielectric layer may be reduced.

However, it is difficult to control the amount of the oxygen ionsdiffusing into the high-K gate dielectric layer. If the amount of oxygenions diffusing into the high-K gate dielectric layer is too large, theoxygen ions are able to further oxidize the surface of the substrate.Thus, the thickness of the interface layer between the high-K gatedielectric layer and the substrate is increased.

Further, for the fin field-effect transistor (FinFET) structure, becausethe side surfaces of the fins are the (110) crystal face. Comparing withthe (100) crystal face, the (110) crystal face on the side surfaces ofthe fins has more dangling bonds. Thus, the side surfaces of the finsare easier to absorb the oxygen ions; and the thickness increasing issueof the interface layer may be more obvious.

Thus, before forming the cap layer, an amorphous silicon layer is formedon the cap layer. The amorphous silicon layer may have more danglingbonds. Therefore, the amorphous silicon layer may be able to absorb atleast a portion of the oxygen ions during the thermal annealing processto reduce the amount of the oxygen ions diffusing into the high-K gatedielectric layer. The over-oxidizing issue of the substrate may beavoided.

However, the amorphous silicon layer may cause other issues during thethermal annealing process. The performance of the semiconductor devicesmay be still unacceptable. The amorphous silicon layer is formed on thecap layer alter forming the high-K gate dielectric layer in the openingsin the interlayer dielectric layer and forming the cap layer. Thus, thecontact area between the amorphous silicon layer and the cap layer maybe relatively large. During the thermal annealing process, because thecrystal lattice difference between the cap layer and the amorphoussilicon layer is increased, a stress is generated between the cap layerand the amorphous silicon layer. Further, because the contact areabetween the cap layer and the amorphous silicon layer is relativelylarge, the stress applied on the cap layer caused by the tea amorphoussilicon layer may be too large. The stress may also be transferred intothe high-K gate dielectric layer; and may generate cracks in the high-Kgate dielectric layer and the cap layer. Thus, the performance of thesemiconductor device may be reduced.

The present disclosure provides a semiconductor device and a fabricationmethod thereof. The fabrication method includes providing a basesubstrate and an interlayer dielectric layer on the base substrate.First openings and second openings connecting each other may be formedin the interlayer dielectric layer. The first openings may be formedbetween the base substrate and the second openings; and the firstopenings may expose the surface of the base substrate. Further, themethod may include forming a high-K gate dielectric layer on the bottomand side surfaces of the first openings and the side surfaces of thesecond openings. The high-K gate dielectric layer may have defects.Further, the method may also include forming a cap layer having oxygenions on the interlayer dielectric layer; and forming an amorphoussilicon layer exposing the cap layer on the side surfaces of the secondopenings on the cap layer on the bottoms of the first openings. Further,the method may also include performing a thermal annealing process tothe amorphous silicon layer, the cap layer and the high-K gatedielectric layer. The thermal annealing process may cause the oxygenions in the cap layer to diffuse into the high-K gate dielectric layer;and cause the amorphous silicon layer to absorb the oxygen ions in thecap layer. Further, the method may also include removing the amorphoussilicon layer; and forming a metal layer filling the first opening andthe second openings on the cap layer.

By using present disclosed method, the amount of the oxygen vacancies inthe high-K gate dielectric layer may be reduced and/or eliminated; andthe formation of cracks in the high-K gate dielectric layer and/or thecap layer may be prevented. Further, the over-oxidation of the basesubstrate at the bottom of the first openings may be avoided. Thus, theelectrical in properties of the semiconductor devices may be improved.

FIG. 12 illustrates an exemplary fabrication process of a semiconductordevice consistent with the disclosed embodiments. FIGS. 1-11 illustratesemiconductor structures corresponding to certain stages of theexemplary fabrication process.

As shown in FIG. 12, at the beginning of the fabrication process, a basesubstrate with certain structures is provided (S101). FIG. 1 illustratesa corresponding semiconductor structure.

As shown in FIG. 1, a base substrate is provided; and an interlayerdielectric layer 204 is formed on the base substrate. First openings 210and second openings 220 may be formed in the interlayer dielectric layer204.

Each first opening 210 and a corresponding second opening 220 mayinterpenetrate. The first opening 210 may be between the second opening220 and the base substrate. The first openings 210 may expose thesurface of the base substrate. For illustrative purposes, the boundarybetween a first opening 210 and a corresponding second opening 220 isillustrated as the dashed line in FIG. 1.

In one embodiment, the semiconductor device is a CMOS device. The basesubstrate may include a PMOS region I and an NMOS region II. A firstopening 210 and a corresponding second opening 220 may be formed in theinterlayer dielectric layer 204 in the first region I. A first opening210 and a corresponding second opening 220 may be formed in theinterlayer dielectric layer 204 in the second region II. In someembodiments, the base substrate may include only a PMOS region, or anNMOS region.

In one embodiment, the semiconductor device is a fin field-effecttransistor structure. As shown in FIG. 1, the base substrate may includea semiconductor substrate 201 and fins 202 formed on the semiconductorsubstrate 201.

The semiconductor substrate 201 may be made of Si, Ge, SiGe, SiC, GaAs,or GaIn, etc. The semiconductor substrate 201 may also be a silicon oninsulator (SOI) substrate, or a germanium on insulator (GOI) substrate,etc. The fins 202 may be made of Si Ge, SiGe, SiC, GaAs, or GaIn, etc.In one embodiment, the semiconductor substrate 20 is a Si substrate; andthe fins 202 are made of Si.

In one embodiment, the process for forming the semiconductor substrate201 and the fins 202 may include providing an initial base substrate;forming a patterned hard mask layer (not shown) on the initial basesubstrate; and etching the initial base substrate using the patternedhard mask layer as an etching mask. The initial base substrate after theetching process may be configured as the semiconductor substrate 201.The protruding portions of the initial base substrate on the surface ofthe semiconductor substrate 201 may be configured as the fins 202. Afterthe etching process, the patterned hard mask layer may be removed.

Further, as shown in FIG. 1, the base substrate may also include aninsulation layer 203 formed in the surface of the semiconductorsubstrate 201. The insulation layer 203 may cover portions of the sidesurfaces of the fins 202; and the top surface of they insulation layer203 may be below the top surfaces of the fins 202. The insulation layer203 may be used as the insulation structures of the CMOS device.

The insulation layer 203 may be made of any appropriate material(s),such as silicon oxide, silicon nitride, or silicon oxynitride, etc. Inone embodiment, the insulation layer 203 is made of silicon oxide.

In some embodiments, the semiconductor device is a planar transistorstructure. The base substrate is a planar substrate. The base substratemay be made of Si, Ge, SiGe, SiC, GaAs, GaIn, SOI or GOI, glass, orgroup III-V compound semiconductor, etc. The group III-V compoundsemiconductor may include GaN, or GaAs, etc.

Further, referring to FIG. 1, the first openings 210 and the secondopenings 220 in the PMOS regions I may cross over the fins 202 in thefirst region I; and the bottoms of the first openings 210 may expose thetop and side surfaces of the fins 202 in the PMOS region I. The firstopenings 210 and the second openings 220 in the PMOS region I mayreserve the spatial positions for subsequently funning the first gatestructures.

Further, the first openings 210 and the second openings 220 in the NMOSregion II may cross over the fins 202 in the second region II; and thebottoms of the first openings 210 may expose the top and side surfacesof the fins 202 in the NMOS region II. The first openings 210 and thesecond openings 220 in the NMOS region II may reserve the spatialpositions for subsequently forming the second gate structures.

In one embodiment, a high-K gate dielectric layer may be subsequentlyformed on the bottom and side surfaces of the first openings 210; and anamorphous silicon layer may be formed on the high-K gate dielectriclayer on the bottom surfaces of the first openings 210. Thus, the depthof the first openings 210 may not be very large. If the depth of thefirst openings 210 is too large, the contact area between thesubsequently formed amorphous silicon layer and the high-K gatedielectric layer may be too large. During a subsequent thermal annealingprocess, the stress on the high-K gate dielectric layer applied by theamorphous silicon layer may be too large; and the high-K gate dielectriclayer may be broken. Thus, the depth of the first openings 210 may besmaller than, or equal to the depth of the second openings 220. Further,the depth of the first openings 210 may be greater than, or equal to asum of the thickness of the high-K gate dielectric layer subsequentlyformed on the bottom of be first openings 210 and the thickness of thesubsequently formed cap layer and the thickness of the subsequentlyformed amorphous silicon layer.

Further, as shown in FIG. 1, first source/drain doping regions 211 maybe formed in the fins 202 at two sides of the first openings 210 in thePMOS regions I. Second source/drain doping region 212 may be formed inthe fins 202 at two sides of the first openings 210 in the MOOS regionII.

The doping ions in the first source/drain doping regions 211 may bedifferent from the doping ions in the second source/drain doping regions212. In one embodiment, the doping ions in the first source/drain dopingregions 211 are P-type ions, such as B ions, Ga ions or In ions, etc.The doping ions in the second source/drain doping regions 212 may beN-type ions, such as P ions, As ions, or Sb ions, etc.

The process for thrilling the interlayer dielectric layer 204, the firstopenings 210 and the second openings 220 may include forming first dummygate structures on portions of the surface of the base substrate in thePMOS regions I and second dummy gate structures on portions of the basesubstrate in the NMOS region II; forming the first source/drain dopingregions 211 in the base substrate in the PMOS region I at two sides ofthe first dummy gate structures; and forming the second source/draindoping regions 212 in the base substrate in the NMOS region H at twosides of the second dummy gate structures; forming the interlayerdielectric layer 204 over the base substrate to cover the side surfacesof the first dummy gate structures and the second dummy gate structures;removing the first dummy gate structures to form the first openings 210and the second openings 220 in the PMOS region I; and removing thesecond dummy gate structures to form the first openings 210 and thesecond openings 220 in the NMOS region II.

In one embodiment, as shown in FIG. 1, sidewall spacers 200 may beformed on the sidewall surfaces of the first dummy gate structures andthe second dummy gate structures. After removing the first dummy gatestructures and the second dummy gate structures, the sidewall spacers200 may be kept.

The sidewall spacers 200 may be made of any appropriate material(s). Inone embodiment the sidewall spacers 200 are made of silicon oxide.

Returning to FIG. 12, after forming the first openings 210 and thesecond openings 220, a high-K gate dielectric layer may be formed(S102). FIG. 2 illustrates a corresponding semiconductor.

As shown in FIG. 2, a high-K gate dielectric layer 206 is formed on thebottom and side surfaces of the first opening 210 and the side surfacesof the second openings 220. Specifically, the high-K gate dielectriclayer 206 may also be formed on the sidewall spacers 200. The high-Kgate dielectric layer 206 may also be on the top surface of theinterlayer dielectric layer 204. In one embodiment, before forming thehigh-K gate dielectric layer 206, an interface layer 205 may be formedon the surfaces of the fins 202 on the bottoms of the first openings210.

The high-K gate dielectric layer 206 may be made of any appropriatehigh-K dielectric material(s). As used herein, the high-K dielectricmaterial may refer to the dielectric material having a relativedielectric constant greater than the relative dielectric constant ofsilicon oxide. The high-K dielectric material may include HfO₂, HfSiO,HiSiOn, HfTaO, HfTiO, HfZrO, ZrO₂, or Al₂O₃, etc.

Various processes may be used to form the high-K gate dielectric layer206, such as a chemical vapor deposition (CVD) process, a physical vapordeposition (PVD) process, or an atomic layer deposition (ALD) process,etc. In one embodiment, the high-K gate dielectric layer 206 is made offifth. The thickness of the high-K gate dielectric layer 206 may be in arange of approximately 5 Å-15 Å. An ALD process is used to form thehigh-K gate dielectric layer 206.

The high-K gate dielectric layer 206 may have defects. The defects mayinclude one or more types from oxygen vacancies, dangling bonds andunbonding ions, etc.

Taking the oxygen vacancies defects as an example, because the high-Kdielectric material may often be ion crystals, each metal ions may havea plurality of bonds with oxygen ions. When oxygen ions are indeficiency, it may be easy to form oxygen vacancies. The oxygenvacancies may introduce a bandgap status in the center of the bandgap ofthe high-K dielectric material; and become the defect energy level ofthe conductive mechanism. If the high-K gate dielectric layer 206 isdirectly used as a portion of the gate dielectric layer of the gatestructures, the dielectric relaxation issue in the semiconductor devicemay be prominent.

The interface layer 205 may be used to improve the interface propertybetween the high-K gate dielectric layer 206 and the base substrate. Inone embodiment, the interface layer 205 may be formed on the top andside surfaces of the fins exposed by the first openings 210.

The interface layer 205 may be made of any appropriate material(s). Inone embodiment, the interface layer 205 is made of silicon oxide.

Various processes may be used to form the interface layer 205, such as athermal oxidation process, or a chemical oxidation process, etc. In oneembodiment, the interface layer 205 is formed by a thermal oxidationprocess.

After forming the high-K gate dielectric layer 206, the high-K gatedielectric layer 206 may be repaired. The repairing process may be ableto increase the density of the high-K gate dielectric layer 206. Therepairing process may be any appropriate process, such as a rapidthermal annealing process, or a spike thermal annealing process, etc.The temperature of the rapid thermal annealing process may beapproximately 750° C.; and the time duration of the rapid thermalannealing process may be in a range of approximately 5 s-10 s. Thetemperature of the spike thermal annealing process may be approximately850° C.

Returning to FIG. 12, after forming the high-K gate dielectric layer206, a cap layer may be firmed (S103). FIG. 3 illustrates acorresponding semiconductor structure.

As shown in FIG. 3, a cap layer 207 is formed on the high-K gatedielectric layer 206. The cap layer 207 may have oxygen ions.

The cap layer 207 may be able to protect the high-K gate dielectriclayer 206; and prevent the subsequent processes from damaging the high-Kgate dielectric layer 206. Further, during the subsequent thermalannealing, process, the oxygen ions in the cap layer 207 may diffuseinto the high-K gate dielectric layer 206; and the amount of the oxygenvacancies in the high-K gate dielectric layer 207 may be reduced.

The cap layer 207 may be made of any appropriate material(s). In oneembodiment, the cap layer 207 is made of oxygen-ion-containing TiN. Insome embodiments, the cap layer may be oxygen-ion-containing TaN.

To ensure the amount of the oxygen ions diffusing into the high-K gatedielectric layer 206 during the subsequent thermal annealing process tobe enough, the amount of the oxygen ions in the cap layer 207 should notbe too small. Further, the amount of the oxygen ions in the cap layer207 may not be too large, or after the oxygen ions entirely occupy theoxygen vacancies during the subsequent thermal annealing process, theoxygen ions may continue to diffuse into the high-K gate dielectriclayer 206 to reach the surfaces of the fins 202; and the surfaces of thefins 202 may be oxidized. Thus, in one embodiment, the mole percentileof the oxygen ions in the cap layer 207 may be in a range ofapproximately 0.5%-5%.

The thickness of the cap layer 207 may be in a range of approximately 10Å-60 Å. Various processes may be used to form the cap layer 207, such asa CVD process, a PVD process, or an ALD process, etc.

Returning to FIG. 12, after forming the cap layer 207, an amorphoussilicon film may be formed (S104). FIG. 4 illustrates a correspondingsemiconductor structure.

As shown in FIG. 4, an amorphous silicon film 208 is formed on the caplayer 207 on the side and bottom surfaces of the first openings 210 andthe side surfaces of the second openings 220. The amorphous silicon film208 may provide a process base for subsequently forming an amorphoussilicon layer on the cap layer 207 on the bottoms of the first openings210.

The amorphous silicon film 208 is made of amorphous silicon. Theamorphous film 208 may have a relatively large amount of dangling bonds.Accordingly, the subsequently formed amorphous silicon layer may alsohave a relatively large amount of dangling bonds.

The thickness of the amorphous silicon film 208 may be an appropriatevalue. If the thickness of the amorphous silicon film 208 is too small,the subsequently formed amorphous silicon layer may be too thin.Accordingly, the ability of the amorphous silicon layer for absorbingthe oxygen ions in the cap layer 207 during the subsequent thermalannealing process may be limited. If the thickness of the amorphoussilicon film 208 is too large, the subsequently formed amorphous siliconlayer may be too thick. Accordingly, the stress applied to the high-Kgate dielectric layer 206 by the amorphous silicon layer during thesubsequent thermal annealing process may be relatively large; and thehigh-K gate dielectric layer 206 may be broken. Further, the ability ofthe amorphous silicon layer for absorbing the oxygen ions in the caplayer 207 during the subsequent thermal annealing process may be toostrong. Thus, the amount of the oxygen ions diffusing into the high-Kgate dielectric layer 206 may be reduced; and the amount of the oxygenvacancies in the high-K gate dielectric layer 206 after the thermalannealing process may still be relatively large. Thus, in oneembodiment, the thickness of the amorphous silicon film 208 may be in arange of approximately 20 Å-80 Å.

Various processes may be used to form the amorphous silicon film 208. Inone embodiment, the amorphous silicon film 208 is formed by a CVDprocess. In some embodiments, the amorphous silicon film may be formedby an ALD process, or a PVD process.

Returning to FIG. 12, after forming the amorphous silicon film 208, afilling film may be formed (S105). FIG. 5 illustrates a correspondingsemiconductor structure.

As shown in FIG. 5, a filling film 209 is formed on the amorphoussilicon film 208. The filling film 209 may fill the first openings 210and the second openings 220. The filling film 209 may provide a processbase for subsequently forming a filling layer.

The filling film 209 may be made of a material that may be easilyremoved. Further, the process for subsequently removing the fillinglayer may not adversely affect the high-K gate dielectric layer 206 andthe cap layer 207.

Thus, the filling film 209 may be made of an organic dielectric layer(ODL) material, a bottom anti-reflective coating (BARC) material, or adeep UV light absorbing oxide (DUO) material, etc. For example, the DUOmaterial may be a polysiloxane material, including CH₃—SiO_(x), Si—OH,or SiOH₃, etc.

In one embodiment, the filling film 209 is made of an ODL material. Thefilling film 209 made of the ODL material may be formed by aspin-coating process.

After forming the filling film 209, the top surface of the filling film209 may be planarized. In one embodiment, the top of the filling film209 may be higher than the amorphous silicon film 208 above the top ofthe interlayer dielectric layer 204. In some embodiments, the top of thefilling film 209 may level with the amorphous silicon film 208 above thetop of the interlayer dielectric layer 204.

Returning to FIG. 12, after forming the filling film 209, a fillinglayer may be formed (S106). FIG. 6 illustrates a correspondingsemiconductor structure.

As shown in FIG. 6, a filling layer 301 is formed in the first openings210. The filling layer 301 may be formed by etching back the fillingfilm 209. Specifically, the filling layer 301 may be formed by removingthe portions of the filling film 209 in the second openings 220.

Various processes may be used to remove the portions of the filling film209 in the second openings 220. In one embodiment, a dry etching processmay be used to remove the portions of the filling film 209 in the secondopenings 220. In some embodiments, the portions of the filling film 209in the second openings 220 may be removed by a wet etching process, orby sequentially performing a dry etching process and a wet etchingprocess.

Returning to FIG. 12, after forming the filling layer 301, an amorphoussilicon layer may be firmed (S107). FIG. 7 illustrates a correspondingsemiconductor structure.

As shown in FIG. 7, an amorphous silicon layer 302 is formed on the caplayer 207 on the side surfaces and the bottoms of the first openings210. The amorphous silicon layer 302 may expose the cap layer 207 on theside surfaces of the second openings 220.

Specifically, the amorphous silicon layer 302 may be formed by etchingthe amorphous silicon film 208 on the side surfaces of the secondopenings 220 using the filling layer 301 as an etching mask. That is,the portions of the amorphous silicon film 208 on the side surfaces ofthe second openings 220 may be removed; and the amorphous silicon layer302 may be formed on the high-K gate dielectric layer 206 on the bottomsof the first openings 210.

The portions of the amorphous silicon film 208 on the side surfaces ofthe second openings 220 may be removed by any appropriate process. Inone embodiment, a dry etching process is used to remove the portions ofthe amorphous silicon film 208 on the side surfaces of the secondopenings 220.

Referring to FIG. 7, in one embodiment, the amorphous silicon layer 302may be on the cap layer 207 on the side surfaces of the first openings210 and the bottoms of the first openings 210. In some embodiments, theamorphous silicon layer may be only on the cap layer on the bottoms ofthe first openings 210.

According to the descriptions of the amorphous silicon film 208, theamorphous silicon layer 302 is made of amorphous silicon. The thicknessof the amorphous silicon layer 302 may be in a range of approximately 20Å-80 Å.

Returning to FIG. 12, after forming the amorphous silicon layer 302, thefilling layer 301 may be removed (S108). FIG. 8 illustrates acorresponding semiconductor structure.

As shown in FIG. 8, the filling layer 301 is removed. The filling layer301 may be removed by any appropriate process. In one embodiment, thefilling layer 301 is removed by a plasma ashing process. The gas of theplasma ashing process may include O₂. In some embodiments, the fillinglayer may be removed by a wet photoresist removing process.

In some embodiments, the process for forming the amorphous silicon layermay include forming an amorphous silicon film on the cap layer to fillthe first openings and the second openings. Then, an etch-back processmay be used to remove the portions of the amorphous silicon film in thesecond openings; and the portions of the amorphous silicon film in thefirst openings may be kept; and may be configured as the amorphoussilicon layer.

Returning to FIG. 12, after removing the filling layer 301, a thermalannealing process may be performed (S109). FIG. 9 illustrates acorresponding semiconductor structure.

As shown in FIG. 9, a thermal annealing process 303 is performed on theamorphous silicon layer 302, the cap layer 207 and the high-K gatedielectric layer 206. The thermal annealing process 303 may cause theoxygen ions in the cap layer 207 to diffuse into the high-K gatedielectric layer 206. Further, the thermal annealing process 303 mayalso cause the amorphous silicon layer 302 to absorb the oxygen ions inthe cap layer 207.

Because the high-K gate dielectric layer 206 may have oxygen vacancies,during the thermal annealing process 303, the oxygen ions in the caplayer 207 may diffuse into the high-K gate dielectric layer 206, theamount of the oxygen vacancies in the high-K gate dielectric layer 206may be reduced. Specifically, the oxygen ions diffusing into the high-Kgate dielectric layer 206 may occupy the oxygen vacancies. Thus, theamount of the oxygen vacancies in the high-K gate dielectric layer 206may be reduced. Accordingly, the dielectric relaxation issue in thehigh-K gate dielectric layer 206 may be improved; and the PBTI and theNBTI issues of the semiconductor structure may be improved.

Further, the thermal annealing process 303 may also be able to passivatethe dangling bonds and/or the unbonding ions in the high-K gatedielectric layer 206. Thus, the amount of the dangling bonds and/or theunbonding ions in the high-K gate dielectric layer 206 may be reduced.

Further, the thermal annealing process 303 may be able to passivate theunbonding silicon ions and the unbonding oxygen ions to chemicallyrearrange the unbonding silicon ions and the unbonding oxygen ions.Thus, the properties of the interface layer 205 may be improved; and theinsulation property and the density of the interface layer 205 may beimproved.

Further, during the thermal annealing process 303, the amorphous siliconlayer 302 may absorb the oxygen ions in the cap layer 207. The danglingbonds in the amorphous silicon layer 302 may have a relatively strongabsorption to the oxygen ions. Thus, the amount of the oxygen ionsdiffusing into the high-K gate dielectric layer 206 may be effectivelyreduced. Accordingly, it may prevent excessive oxygen ions fromdiffusing into the base substrate on the bottom of the first openings210, when there is no oxygen vacancy in the high-K gate dielectric layer206 to bond with the oxygen ions, to oxidize the base substrate on thebottoms of the first openings 210.

Specifically, if the all the oxygen vacancies in the high-K gatedielectric layer are occupied by the oxygen ions; and there still areoxygen ions diffusing into the high-K gate dielectric layer, theexcessive oxygen ions may diffuse into the base substrate on the bottomof the first openings through the high-K gate dielectric layer, the basesubstrate on the bottom of the first openings may be oxidized. Theamorphous silicon layer may be able to absorb a portion of the oxygenions in the cap layer to prevent the excessive oxygen ions fromdiffusing into the base substrate.

In one embodiment, the thermal annealing process 303 may sequentiallyinclude a first annealing process and a second annealing process. Thetemperature of the second annealing process may be higher than thetemperature of the first annealing process. Using such two thermalannealing processes may further improve of the repairing effect of thedefects in the high-K gate dielectric layer 206.

The thermal annealing process 103 may include any appropriate thermalannealing processes. In one embodiment, the first annealing process is aspike thermal annealing process; and the second annealing process may bea laser thermal annealing process or a flash thermal annealing process.The temperature of the first annealing process may be in a range ofapproximately 800° C.-1000° C. The temperature of the second annealingprocess may be in a range of approximately 950° C.-1150° C.

In some embodiments, the thermal annealing process may be a single stepannealing process. That is, the thermal annealing process may onlyinclude one annealing process.

In the high-K gate dielectric layer 206, only the portions of the high-Kgate dielectric layer 206 on the bottoms of the first openings 210 mayaffect the electrical properties of the semiconductor devices. Thethermal annealing process 303 may reduce the amount of the defects inthe high-K gate dielectric layer 206 on the bottoms of the firstopenings 210. For example, the oxygen vacancies in the high-K gatedielectric layer 206 on the bottoms of the first openings 210 may bereduced. Thus, the properties of the high-K gate dielectric layer 206affecting the performance of the semiconductor device may be improved.

At the same time, because the interlayer layer dielectric layer 204 andthe sidewall spacers 200 may be close to the sidewalls of the secondopenings 220, the oxygen ions in the cap layer 207 on the side surfacesof the second openings 220 may diffuse into the interlayer dielectriclayer 204 and the sidewall spacers 200. The ions diffusing into theinterlayer dielectric layer 204 and the sidewall spacers 200 may haveminimal, or not effect to the electrical properties of the semiconductordevice.

Further, during the thermal annealing process 303, the internal materialstructure of the amorphous silicon layer 302 may change; and theinternal material structures of the cap layer 207 and the high-K gatedielectric layer 206 may also change. Such material structure changesmay cause the amorphous silicon layer 302, the cap layer 207 and thehigh-K gate dielectric layer 206 to have lattice mismatches; andstresses may be generated. In one embodiment, because the contact areabetween the cap layer 207 and the amorphous silicon layer 302 may berelatively small, the stress endured by the high-K gate dielectric layer206 may also be relatively small. Thus, cracks caused by a relativelylarge stress may be prevented from forming in the high-K gate dielectriclayer 206 and the cap layer 207. Accordingly, the high-K gate dielectriclayer 206 and the cap layer 207 may have acceptable properties.

In one embodiment, the bottoms of the first openings 210 may exposeportions of the top and side surfaces of the fins 202; and the sidesurfaces of the fins 202 may have some dangling bonds. However, becausethe oxygen vacancies in the high-K gate dielectric layer 206 may absorboxygen ions; and the dangling bonds in the amorphous silicon layer 302may also absorb the oxygen ions, the difficulties for the dangling bondson the side surfaces of the fins 20′7 far away from the cap layer 207 toabsorb the oxygen ions may be increased. Thus, the oxidation of the basesubstrate on the bottoms of the first openings 210 during the thermalannealing process 303 may be avoided. Accordingly, the thicknessincrease issue of the interface layer 205 may be avoided.

Returning to FIG. 12, after performing the thermal annealing process,the amorphous silicon layer 302 may be removed (S110). FIG. 10illustrates a corresponding semiconductor structure.

As shown in FIG. 10, the amorphous silicon layer 302 is removed. Theamorphous silicon layer 302 may be removed by any appropriate process.In one embodiment, the amorphous silicon layer 302 is removed by a wetetching process. The etching solution of the wet etching process mayinclude tetramethylammonium hydroxide or ammonia, etc.

To prevent the process for removing the amorphous silicon layer 302 fromdamaging the high-K gate dielectric layer 206 and the cap layer 207, thetemperature of the etching solution of the wet etching process may beset in an appropriate range. In one embodiment, the temperature of theetching solution may be in a range of approximately 25° C.-75° C.

Returning to FIG. 12, after removing the amorphous silicon layer 302, ametal layer may be formed (S111). FIG. 11 illustrates a correspondingsemiconductor structure.

As shown in FIG. 11, a metal layer 304 is formed in the first openings210 and the second openings 220. The metal layer 304 may fill the firstopenings 210 and the second openings 220.

The metal layer 304 may be made of any appropriate material(s), such asone or more of Al, Cu, W, Ag, Au, Pt, Ni, and Ti, etc. Various processesmay be used to form the metal layer 304, such as a CVD process, a PVDprocess, or an ALD process, etc. In one embodiment, the metal layer 304is made of W; and the metal layer 304 is formed by a metal organic CVDprocess.

The process fir firming the metal layer 304 may include forming a metalfilm in the first openings 210 and the second openings 220 and on thecap layer 207. The metal film may fill the first openings 210 and thesecond openings 220; and the top of the metal film may be above the topof the interlayer layer dielectric layer 204. Then, the portions of themetal film above the interlayer dielectric layer 204 may be removed; andthe portions of the cap layer 206 and the high-K gate dielectric layer206 above the interlayer dielectric layer 204 may also be removed. Theportions of the metal film above the interlayer dielectric layer 204 andthe portions of the cap layer 206 and the high-K gate dielectric layer206 above the interlayer dielectric layer 204 may be removed by apolishing process.

In one embodiment, as shown in FIG. 11, to improve the threshold voltageof the semiconductor device, before forming the metal layer 304, aP-type work function layer 311 may be formed on the cap layer 207 in thePMOS region I; and an N-type work function layer 312 may be formed onthe cap layer 207 in the NMOS region II. The work function of the P-typework function material may be in a range of approximately 5.1 eV-5.5 eV.The work function of the N-type work function material may be in a rangeof approximately 3.9 eV-4.5 eV, such as 4 eV, 4.1 eV, or 4.3 eV, etc.

In one embodiment, the P-type work function layer 311 is made of TiN. Insome embodiments, the P-type work function layer may also be made ofTaN, TiSiN, or TaSiN, etc.

In one embodiment, the N-type work function layer 312 is made of TIAl.In some embodiments, the N-type work function layer may also be made oneor more of TiAlN, TiAlC and AlN, etc.

In the disclosed embodiments, because the oxygen vacancies in thedielectric layer 206 may be reduced, the dielectric relaxation issue ofthe dielectric layer 206 may be improved. Thus, the dielectricrelaxation current of the semiconductor device may be reduced.Therefore, the disclosed methods may be able to improve the PBTI andNBTI of the semiconductor devices; and enhance the electrical propertiesof the semiconductor devices.

Further, because the contact area between the cap layer 207 and theamorphous silicon layer 302 may be relatively small, the stress appliedto the cap layer 207 and the high-K gate dielectric layer 206 by theamorphous silicon layer 302 may be relatively small during the thermalannealing process. Accordingly, the cap layer 207 and the high-K gatedielectric layer 206 may have acceptable morphologies during the thermalannealing process. Thus, cracks may be prevented from forming in thehigh-K gate dielectric layer 206; and the electrical properties of thesemiconductor devices may be improved.

Thus, a semiconductor device may be formed by the disclosed methods andprocesses. FIG. 11 illustrates a corresponding semiconductor structure.

As shown in FIG. 11, the semiconductor device includes, a base substratehaving PMOS region I and an NMOS region II and gate structures formed onthe base substrate. The base substrate may include a semiconductorsubstrate 201 and fins 202 formed on the semiconductor substrate 201.The gate structures may include an interface layer 205 formed on thebase substrate; a high-K gate dielectric layer 206 formed on theinterface layer 205; a cap layer 207 formed on the high-K gatedielectric layer 206; a P-type work function layer 311 formed on thehigh-K gate dielectric layer 206 in the PMOS region I; an N-type workfunction layer 312 formed on the high-K gate dielectric layer 206 in theNMOS region II; and a metal layer 304 formed on the P-type work functionlayer 311 and the N-type work function layer 312. Further, thesemiconductor device may also include an interlayer dielectric layer 204formed over the base substrate. The interlayer dielectric layer 204 maycover the side surfaces of the gate structures. Further, thesemiconductor device may also include source/drain doping regions 211formed in the base substrate at two sides of the gate structures; andsidewall spacers 200 formed between the gate structures and theinterlayer dielectric layer 204. The detailed structures andintermediate structures are described above with respect to thefabrication processes.

Therefore, comparing the existing methods, after forming theoxygen-containing cap layer on the high-K gate dielectric layer, anamorphous silicon layer may be formed on the cap layer on the bottoms ofthe first openings. Then, a thermal annealing process may be performedon the amorphous silicon layer, the cap layer and the high-K gatedielectric layer. The thermal annealing process may cause the oxygenions in the cap layer to diffuse into the high-K gate dielectric layer;and also cause the amorphous silicon layer to absorb the oxygen ions inthe cap layer. Thus, the defects in the high-K gate dielectric layer onthe bottoms of the first openings may be reduced. Accordingly, the DRcurrent of the semiconductor devices may be reduced.

Further, the amorphous silicon layer may absorb the oxygen ions duringthe thermal annealing process. Thus, the amount of the oxygen ionsdiffusing into the high-K dielectric layer may be reduced; and theoxygen ions may be prevented from diffusing into the base substrate onthe bottoms of the first openings. Thus, the base substrate on thebottoms of the first openings may not be oxidized.

Further, the amorphous silicon layer may expose the cap layer on theside surfaces of the second openings. Thus, the contact area between theamorphous silicon layer and the cap layer may be relatively small.Accordingly, during the thermal annealing process, the stress applied tothe cap layer by the amorphous silicon layer may be relatively small.Thus, cracks caused by a relatively large stress may be prevented fromforming in the cap layer and/or the high-K gate dielectric layer. Thus,the electrical properties of the semiconductor devices may be desired.

The above detailed descriptions only illustrate certain exemplaryembodiments of the present disclosure, and are not intended to limit thescope of the present disclosure. Those skilled in the art can understandthe specification as whole and technical features in the variousembodiments can be combined into other embodiments understandable tothose persons of ordinary skill in the art. Any equivalent ormodification thereof, without departing from the spirit and principle ofthe present disclosure, falls within the true scope of the presentdisclosure.

What is claimed is:
 1. A method for fabricating a semiconductor device,comprising: forming an interlayer dielectric layer on a base substrate;forming a plurality of first openings and second openings in theinterlayer dielectric layer, one first opening connecting to one secondopening, the one first opening being between the one second opening andthe base substrate to expose the base substrate; forming a high-K gatedielectric layer on side and bottom surfaces of the first openings andon side surfaces of the second openings; forming a cap layer, containingoxygen ions, on the high-K gate dielectric layer; forming an amorphoussilicon layer on the cap layer and at least on the bottom surfaces ofthe first openings, wherein forming the amorphous silicon layercomprises: forming an amorphous silicon film on the cap layer on theside and bottom surfaces of the first openings and the side surfaces ofthe second openings; forming a filling layer to fill the first openings;etching portions of the amorphous silicon film on the side surfaces ofthe second openings using the filling layer as an etching mask; andremoving the filling layer; after forming the amorphous silicon layer,performing a thermal annealing process on the cap layer and the high-Kgate dielectric layer through the amorphous silicon layer to cause theoxygen ions to diffuse into the high-K gate dielectric layer and theamorphous silicon layer to absorb the oxygen ions; removing theamorphous silicon layer; and forming a metal layer to fill the firstopenings and the second openings.
 2. The method according to claim 1,wherein: the high-K gate dielectric layer has defects including oxygenvacancies; and the amorphous silicon layer exposes the side surfaces ofthe second openings.
 3. The method according to claim 1, wherein: thethermal annealing process includes a first annealing process and asecond annealing process; and a temperature of the second annealingprocess is greater than a temperature of the first annealing process. 4.The method according to claim 3, wherein: the first annealing process isa spike annealing process; and the second annealing process is one of alaser annealing process and a flash annealing process.
 5. The methodaccording to claim 3, wherein: the temperature of the first annealingprocess is in a range of approximately 800° C.−1000° C.; and thetemperature of the second annealing process is in a range ofapproximately 950° C.−1150° C.
 6. The method according to claim 1,wherein: the amorphous silicon layer is removed by a wet etchingprocess; an etching solution of the wet etching process includes one oftetramethylammonium hydroxide and ammonia; and a temperature of theetching solution is in a range of approximately 25° C.-75° C.
 7. Themethod according to claim 1, before forming the high-K gate dielectriclayer, further comprising: forming an interface layer on a surface ofthe base substrate and on the bottom surface of the first openings. 8.The method according to claim 1, wherein: a depth of the first openingsis smaller than a depth of the second openings.
 9. The method accordingto claim 1, wherein forming the filling layer comprises: forming afilling film filling the first openings and the second openings on theamorphous silicon film; etching the filling film to remove portions ofthe filling film in the second openings.
 10. The method according toclaim 1, wherein: the filling layer is made of one of an organicdielectric (ODL) material, a back antireflective (BARC) material and adeep UV light absorbing oxide (DUO) material.
 11. The method accordingto claim 1, after forming the high-K gate dielectric layer and beforeforming the amorphous silicon layer, further comprising: repairing thehigh-K gate dielectric layer.
 12. The method according to claim 11,wherein: the high-K gate dielectric layer is repaired by one of a rapidthermal annealing process and a spike annealing process; a temperatureof the thermal annealing process is approximately 750° C.; a timeduration of the thermal annealing process is in a range of approximately5 s-10 s; and a temperature of the spike annealing process isapproximately 850° C.
 13. The method according to claim 1, wherein: thebase substrate includes a semiconductor substrate and a plurality offins formed on the semiconductor substrate; and the first openingsexpose portions of side and top surfaces of the fins.
 14. A method forfabricating a semiconductor device, comprising: forming an interlayerdielectric layer on a base substrate; forming a plurality of firstopenings and second openings in the interlayer dielectric layer, onefirst opening connecting to one second opening, the one first openingbeing between the one second opening and the base substrate to exposethe base substrate; forming a high-K gate dielectric layer on side andbottom surfaces of the first openings and on side surfaces of the secondopenings; forming a cap layer, containing oxygen ions, on the high-Kgate dielectric layer; forming an amorphous silicon layer on the caplayer and at least on the bottom surfaces of the first openings whereinforming the amorphous silicon layer comprises: forming an amorphoussilicon film filling the first openings and the second openings on thecap layer; and etching back the amorphous silicon film to removeportions of the amorphous silicon film in the second openings andconfiguring remaining portions of the amorphous silicon film in thefirst openings as the amorphous silicon layer; performing a thermalannealing process on the amorphous silicon layer, the cap layer and thehigh-K gate dielectric layer to cause the oxygen ions to diffuse intothe high-K gate dielectric layer; removing the amorphous silicon layer;and forming a metal layer to fill the first openings and the secondopenings.
 15. The method according to claim 14, wherein: the high-K gatedielectric layer has defects including oxygen vacancies; and theamorphous silicon layer exposes the side surfaces of the secondopenings.
 16. The method according to claim 14, wherein: the thermalannealing process includes a first annealing process and a secondannealing process; and a temperature of the second annealing process isgreater than a temperature of the first annealing process.
 17. Themethod according to claim 16, wherein: the first annealing process is aspike annealing process; and the second annealing process is one of alaser annealing process and a flash annealing process.
 18. The methodaccording to claim 16, wherein: the temperature of the first annealingprocess is in a range of approximately 800° C.-1000° C.; and atemperature of the second annealing process is in a range ofapproximately 950° C.-1150° C.
 19. The method according to claim 14,wherein: the amorphous silicon layer is removed by a wet etchingprocess; an etching solution of the wet etching process includes one oftetramethylammonium hydroxide and ammonia; and a temperature of theetching solution is in a range of approximately 25° C.-75° C.